| 000 | 00983cam a2200265 a 4500 | ||
|---|---|---|---|
| 001 | 0000030592 | ||
| 005 | 20230921140137.0 | ||
| 008 | 041013s2005 njum b a001 0 eng | ||
| 010 | _a2004058503 | ||
| 020 |
_a9780471720010 : _cUS$174.00 |
||
| 100 | 1 |
_aLieberman, M. A. _q(Michael A.) |
|
| 245 | 1 | 0 |
_aPrinciples of plasma discharges and materials processing / _cMichael A. Lieberman and Allan J. Lichtenberg. |
| 250 | _asecond edition. | ||
| 260 |
_aHoboken, N.J. : _bWiley-Interscience, _c2005. |
||
| 264 |
_aHoboken, N.J. : _bWiley-Interscience, _c2005 |
||
| 300 |
_axxxv, 757 pages : _billustration ; _c25 cm. |
||
| 504 | _aIncludes bibliographical references (p. 735-748) and index. | ||
| 650 | 0 | _aPlasma dynamics. | |
| 650 | 0 |
_aThin films _xSurfaces. |
|
| 650 | 0 | _aPlasma etching. | |
| 650 | 0 |
_aPlasma chemistry _xIndustrial applications. |
|
| 700 | 1 | _aLichtenberg, Allan J. | |
| 989 | _a20230822095114.0 | ||
| 999 |
_c15652 _d15652 |
||